Modeling and Analyzing the Electrical Properties of Low Resistivity Silicon Through Silicon Via (TSV) in 2.5D Integrated Circuit

Shi-wei WANG,Bin LIU,Wei LU,Yang-yang YAN,Shu-fen CHEN
DOI: https://doi.org/10.15918/j.tbit1001-0645.2017.02.016
2017-01-01
Abstract:2.5D integration technology can enable the heterogeneous integration of several chips which fabricated by different technology or substrate.The low resistivity silicon through silicon via (LRS TSV) can take the place of copper TSV as its good conductivity,as well as the merits of simple process and low costs.The electromagnetic (EM) simulation of LRS TSV was performed.And the simulation results show that its return loss can be-24.7 dB and insertion loss can be-0.52 dB at 1 GHz which meet the requirement of transmission line.The electrical model of LRS TSV was proposed.Compared with electrical model,the EM results show good agreement,and it can be applied in 0.1~10 GHz tape width.In the end,the simulation results of time domain transmission (TDT),time domain reflection (TDR) and eye diagram show that the resistance of LRS TSV has more considerable impacts on voltage drop than the parasitic capacitance of LRS TSV.
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