HfO2-passivated Black Phosphorus Field Effect Transistor with Long-Termed Stability and Enhanced Current On/off Ratio

Boran Xing,Liao Guan,Ying Yu,Xinyue Niu,Xiaoyuan Yang,Shucheng Zhang,Jiadong Yao,Dan Wang,Jian Sha,Yewu Wang
DOI: https://doi.org/10.1088/1361-6528/ab1ffe
IF: 3.5
2019-01-01
Nanotechnology
Abstract:Enhanced on/off ratio, obvious threshold voltage left shift, newly emerging bipolar field effect performance and most importantly, excellent stability in ambient condition have been reported for the HfO2-passivated black phosphorus field effect transistors. Both Raman spectra and x-ray photoelectron spectroscopy (XPS) show a thickness reduction effect after HfO2 passivation, XPS further demonstrates that the formation of P-Hf and P-O chemical bonds contributes to the thinning of layered black phosphorus (BP), in which P-Hf bonds also provide chemical protection for BP flakes from degradation. Atomic force microscopy measures the thickness of the passivation layer and also verifies the stability of the passivated BP flakes.
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