High Performance Transistors Based On Two Dimensional Materials

Mingqiang Huang,Xiong Xiong,Tiaoyang Li,Yanqing Wu
DOI: https://doi.org/10.1109/ASICON.2017.8252660
2017-01-01
Abstract:In this paper, high performance black phosphorus (BP) p-type filed effect transistors (pFET) have been demonstrated by using atomic layer deposition (ALD) HfLaO as the back-gate dielectrics. Compared with traditional dielectric layer of SiO2, the ALD high-kappa HfLaO is expected to better screen impurities and reduce surface charge scattering, leading to a larger mobility and higher current. High I-on (at V-d =-2 V) of 468 mu A/mu m at T = 300 K and 921 mu A/m at T = 20 K have been achieved, which is the new record high output current of BP transistors to date. Systematic study on Al2O3 encapsulation by Physical Vapor Deposition (PVD) of 2 nm Al as seeding layer has been carried out, the encapsulated BP transistors show high air stability up to 6 weeks.
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