High Performance Black Phosphorus Electronic and Photonic Devices with HfLaO Dielectric

Xiong,Xuefei Li,Mingqiang Huang,Tiaoyang Li,Tingting Gao,Yanqing Wu
DOI: https://doi.org/10.1109/led.2017.2779877
IF: 4.8157
2018-01-01
IEEE Electron Device Letters
Abstract:As an emerging two-dimensional material, few-layer black phosphorus (BP) shows great potential in nanoelectronics and nanophotonics due to its high carrier velocity. However, non-optimized gate dielectrics often degrade the performance of BP devices severely. In this letter, we demonstrate high-performance BP devices using a novel HfLaO as back gate dielectric with improved interface quality. High current exceeding 1.15 mA/mu m has been achieved at 20 K for BP transistors with improved noise spectral density. Moreover, BP photodetectors with a record high photoresponsivity up to 1.5 x 10(8) A/W and fast response time of 10 mu s at 300 K are demonstrated. Excellent photoresponse in a broadband spectrum range from 514 to 1800 nm at 70 K has also been achieved.
What problem does this paper attempt to address?