Temperature-Stable Black Phosphorus Field-Effect Transistors Through Effective Phonon Scattering Suppression On Atomic Layer Deposited Aluminum Nitride

Wenjun Liu,Hemei Zheng,Kahwee Ang,Hao Zhang,Huan Liu,Jun Han,Weiguo Liu,Qingqing Sun,Shijin Ding,David Wei Zhang
DOI: https://doi.org/10.1515/nanoph-2020-0075
IF: 7.5
2020-01-01
Nanophotonics
Abstract:Black phosphorus (BP) shows great potential in electronic and optoelectronic applications; however, maintaining the stable performance of BP devices over temperature is still challenging. Here, a novel BP field-effect transistor (FET) fabricated on the atomic layer deposited AlN/SiO2/Si substrate is demonstrated. Electrical measurement results show that BP FETs on the AlN substrate possess superior electrical performance compared with those fabricated on the conventional SiO2/Si substrate. It exhibits a large on-off current ratio of 5 x10(8), a low subthreshold swing of <0.26 V/dec, and a high normalized field-effect carrier mobility of 1071 cm(2)V(-1)s(-1) in the temperature range from 77 to 400 K. However, these stable electrical performances are not found in the BP FETs on SiO2/Si substrate when the temperature increases up to 400 K; instead, the electrical performance of BP FETs on the SiO2/Si substrate degrades drastically. Furthermore, to gain a physical understanding on the stable performance of BP FETs on the AlN substrate, low-frequency noise analysis was performed, and it revealed that the AlN film plays a significant role in suppressing the lattice scattering and charge trapping effects at high temperatures.
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