Effects of Al2O3 Capping and Post-Annealing on the Conduction Behavior in Few-Layer Black Phosphorus Field-Effect Transistors

H. M. Zheng,J. Gao,S. M. Sun,Q. Ma,Y. P. Wang,B. Zhu,W. J. Liu,H. L. Lu,S. J. Ding,David W. Zhang
DOI: https://doi.org/10.1109/jeds.2018.2804481
2018-01-01
IEEE Journal of the Electron Devices Society
Abstract:Ambient instability has been proven challenging in black phosphorus field-effect transistors (BP FETs) and a capping layer is thus needed for their practical applications. In this paper, we have examined the effects of Al2O3 capping and O-2 post-annealing on the conduction characteristic of BP FETs. With the Al2O3 capping, it forms p-type into ambipolar transport and the electron mobility dramatically increases to 20-110 cm(2)/V center dot s in our case. Interestingly, with the O-2 post-annealing, the transport can be tuned from ambipolar back to p-type as the annealing time extends. It is attributed that the Al2O3 capping introduces an n-type doping in BP channel while the O-2 post-annealing dopes BP back into p-type. Moreover, after the O-2 post-annealing the interfacial POx might be formed, resulting in the degradation of subthreshold swing and on/off current ratio.
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