Abstract:This review is devoted to the analysis of the problems related to fabrication of the Si porous layers. The review was motivated by a great interest to Si-based porous materials from nano- to macro-scale for various applications in electronics, optoelectronics, photonics, chemical sensors, biosensors, etc. The peculiarities of the silicon porosification and the principles of preparing porous layers are considered in the present article. Various methods used for Si porosification such as chemical stain etching, chemical vapor etching, laser-induced etching, metal-assisted etching, spark processing and reactive ion (plasma) etching were analyzed. However, the main attention was focused on electrochemical porosification of Si. The review discusses in detail the influence of parameters such as electrolyte composition and pH, current density, etching time, temperature, wafer doping and orientation, lighting, magnetic field, and ultrasonic agitation on the process of Si porosification. It was shown that the structure of porous silicon strongly depends on both technological parameters of electrochemical etching and the parameters of the semiconductor subject to treatment. This review also addresses the main properties of porous silicon, porous multilayer and 3D structure formation, oxidation of porous Si, release of the porous layer, drying, storage, etching, filling and surface functionalizing of porous Si. Features of III-V compound porosification are also briefly analyzed.

Investigation of Selectively Forming Porous Silicon Used in MEMS

The Technology of Using Porous Silicon As a Sacrificial Layer in MEMS

Experimental Investigations Of Porous Silicon Sacrificial Layer Techniques On Mems

Investigation of Selectively Forming Nano-Porous Silicon for the Application of MEA

Investigation of Amorphous Silicon As Dry Etch Hard Mask in BEOL Low-k Dielectric Patterning

Design of Μpemfc Fabricated with Porous Silicon

A Surface Micromachining Process for Suspended RF-MEMS Applications Using Porous Silicon

Electrochemical Formation of Self-positioned Nano-Sized Pores on Oxidized Porous Silicon Substrate

Analysis and Design of an Accelerometer Fabricated with Porous Silicon as Sacrificial Layer

Optimization of Metal-Assisted Etchant Components for Fabrication of Porous Silicon

Fabricating Processes of Free-Standing Silicon Nitride Thin Film for MEMS Devices

Fabrication of Silicon-based Microstructures and Its Application in Microchips

Method for Fabricating Micro/Nanostructures Via Scanning Probe Microscope and Anisotropic Wet Etching

Investigation on femtosecond laser combined with dynamic wet etching machining of SiC/SiC

Fabrication Method for Structured Porous Polydimethylsiloxane (PDMS)

Microstructure, Heat Treatment, and Oxidation Study of Porous Silicon Formed on Moderately Doped P-Type Silicon

Study of Fabrication and Etching Processes of PZT Thin Films on Silicon

Preparation Of Porous Silicon By Electrochemical Etching Methods And Its Morphological And Optical Properties

Silicon Porosification: State of the Art

Preparation of porous silicon by vacuum sublimation dealloying method