Ethylene for carbon doping of GaN by atmospheric pressure metal organic chemical vapor deposition

Li Zhang,Zhongyuan Dong,Xuguang Deng,Xin Zhou,Kun Xu,Feng Yang,Guohao Yu,Xiaodong Zhang,Yaming Fan,Zhongming Zeng,Zhipeng Wei,Baoshun Zhang
DOI: https://doi.org/10.1016/j.matlet.2023.134475
IF: 3
2023-05-04
Materials Letters
Abstract:The carbon incorporation properties of GaN from ethylene and trimethylgallium precursors was studied by atmospheric pressure metal organic chemical vapor deposition. It is found that V-III ratio was the main restriction factor for carbon incorporation. Carbon concentration could be regulated effectively one order of magnitude by tuning V-III ratio for C 2 H 4 doped GaN, and would be enhanced at relatively low V-III ratio for self-doped GaN. Low threading dislocation density and atomic flat surface of C 2 H 4 doped GaN films was kept even if carbon doping concentration of 9E18/cm 3 compared with UID-GaN and a high breakdown voltage of 2278V at leakage current of 10μA was obtained in C 2 H 4 doped GaN buffer layer.
materials science, multidisciplinary,physics, applied
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