Influence of Intrinsic or Extrinsic Doping on Lattice Locations of Carbon in Semi-Insulating GaN

Yue Xu,Xuelin Yang,Peng Zhang,Xingzhong Cao,Yao Chen,Shiping Guo,Shan Wu,Jie Zhang,Yuxia Feng,Fujun Xu,Xinqiang Wang,Weikun Ge,Bo Shen
DOI: https://doi.org/10.7567/1882-0786/ab1c19
IF: 2.819
2019-01-01
Applied Physics Express
Abstract:We demonstrate that different doping approaches can significantly influence the lattice locations of carbon (C) in GaN grown by MOCVD. For intrinsically doped GaN with TMGa as the C source, an annealing induced switching process of C atoms from Ga sites to N sites is observed, revealing the existence of substitutional C atoms on both Ga and N sites. While for extrinsically doped GaN with propane as the C precursor, C atoms incorporate almost on N sites. From the viewpoint of growth dynamics, we propose a mechanism for C incorporation into different lattice locations.
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