Threshold Voltage Model for Deep-Submicrometer MOSFET's

李艳萍,徐静平,陈卫兵,邹晓
DOI: https://doi.org/10.3969/j.issn.1004-3365.2005.01.012
2005-01-01
Abstract:Based on analysis on short-channel effect and drain induced barrier lowering (DIBL) effect, a threshold voltage model for high-k MOSFET's is etablished by introducing a coefficient that interrelates the two effects. Influences of various factors on threshold voltage shift are simulated and investigated, and the optimal range of k values is obtained.
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