Abstract:A new analytical current-voltage (I-V) model for submicrometer and deep-submicrometer metal-oxide-semiconductor field-effect transistors (MOSFETs) is developed based on a newly developed charge-control model in metal-oxide-semiconductor structure. Threshold-voltage shift due to quantum mechanical effects, finite inversion layer thickness effects (inversion layer capacitance), as well as increased depletion layer charge density after the strong inversion point are incorporated in the model. Inversion layer charge density with respect to the gate voltage from depletion through weak inversion to strong inversion regions with smooth transition between different regions is given by one expression, Two-dimensional short channel effects such as channel length modulation, drain-induced barrier lowering, mobility degradation, and carrier velocity saturation, as well as polysilicon depletion effects are included in the I-V model. Model results are compared with both numerical results of carrier sheet density and surface potential in the channel, and experimental results of I-V data for submicrometer and deep-submicrometer MOSFETs down to 0.09-mum effective gate length and the accuracy of the model are demonstrated.

MOS Structure Threshold Voltage Model by Rigorously Considering Quantum Mechanical Effect

MOS device threshold voltage model considering quantum mechanical effect including multi-subband occupation

Thorough Analysis of Quantum Mechanical Effects on Mos Structure Characteristics in Threshold Region

Quantum Mechanical Effects on Deep-Submicron MOSFET Subthreshold Characteristics

Carrier Distribution And Threshold Voltage Model In N- And P-Mosfet

Analytical Charge-Control and I-V Model for Submicrometer and Deep-Submicrometer MOSFETs Fully Comprising Quantum Mechanical Effects

Quantum Mechanical Effects on the Threshold Voltage of Surrounding-Gate Mosfets

Quantum Mechanical Consideration On Mosfet'S Characteristics And Scaling

Simulation Study of Device Physics Issues in III&#x2013;V MOSFETs at 10 Nm Node

Quantum Mechanical Effects on the Threshold Voltage of Double-Gate Metal–Oxide–Semiconductor Field-Effect Transistors

Threshold voltage correction model for quantum short channel

Simulation of Advanced N-Mosfet Emphasizing Quantum Mechanical Effects on 2-D Characteristics

Threshold Voltage Correction Model For Quantum Short Channel Effects In Decanano-Scaled Mosfets

A New Correction Model for Quantum Mechanical Effects in MOS Structure

Modeling On Direct Tunneling Current In Ultra-Thin Oxide Nmosfet Considering Quantum Mechanics

Electric Potential and Threshold Voltage Models for Double-Gate Schottky-barrier Source/drain MOSFETs

A new charge model including quantum mechanical effects in MOS structure inversion layer

Analytical Charge Model for MOSFETs with 2-D Quantum Mechanical Effects

Compact I-V Model for Sub-100nm Bulk Silicon MOSFETs

Direct Tunneling Current Model for MOS Devices with Ultra-Thin Gate Oxide Including Quantization Effect and Polysilicon Depletion Effect