MOS device threshold voltage model considering quantum mechanical effect including multi-subband occupation

Yutao Ma,Zhijian Li,Litian Liu
1999-01-01
Abstract:With increasing of the substrate dopant concentration and decreasing of the gate oxide thickness, the influence of quantum mechanical effects (QME) on deep-submicron MOSFET characteristics are getting more and more significant. Experiments results show that QME can result in noticeable threshold voltage (Vth) shift. In this paper, numerical solution with parabolic potential well and analytical solution with triangular well are compared, and the validity of triangular well approximation is demonstrated. Based on the calculation of the subband structure in the quantized region in weak inversion regime, the concepts of quantum effective state density and classical effective state density are proposed, the carrier distribution in subbands is analyzed and the two factors that influence the Vth shift are discussed. Finally, a quantum correction model to threshold voltage is given, which reveals the physical nature of the influence of QME on the Vth shift and gives consistent results with experiments.
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