Compact I-V Model for Sub-100nm Bulk Silicon MOSFETs

Dawei Zhang,Hao Zhang,Guangping Zhu,Xuelian Zhang,Lilin Tian,Zhiping Yu
DOI: https://doi.org/10.3969/j.issn.1674-4926.2005.03.025
2005-01-01
Abstract:Analytical models for the correction to the threshold voltage, due to the two dimensional (2D) quantum mechanical (QM) effects in the transport direction and the QM effects in the poly-silicon gate (poly-gate) region, are established respectively based on the theory of locality and the analytical solution to the 2D Poisson equation and on the density gradient model. These corrections are then combined with the ballistic transport theory to establish a compact I-V model for sub-100 nm MOSFETs. This compact model renders satisfactory results (standard relative error less than 8%) compared to the experimental data of a 45 nm-channel manufactured device provided by TSMC and the numerical results of three sets of sub-100 nm MOSFETs, which prove its accuracy and scalability.
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