A 2D Analytical Model for SCEs in MOSFETs with High-K Gate Dielectric

Qian Xie,Jun Xu,Tianling Ren,Yuan Taur
DOI: https://doi.org/10.1088/0268-1242/25/3/035012
IF: 2.048
2010-01-01
Semiconductor Science and Technology
Abstract:In this paper, a two-dimensional (2D) analytical potential model for MOSFETs with high-k gate dielectric is derived based on solving a boundary value problem with 2D Poisson's equation. A novel approach to estimate short-channel threshold voltage (VT) roll-off analytically is also presented and an explicit expression for the short-channel VT roll-off is obtained. Results show that the minimum surface potential along the channel, the inverse slope of subthreshold current, short-channel VT roll-off and drain-induced barrier lowering (DIBL) predicted by the analytical model are in close agreement with 2D numerical simulation (TCAD Sentaurus) without any fitting parameters even down to a sub-20 nm channel length. This model offers a physical insight into short-channel effects and how each of the parameters of a MOSFET quantitatively impacts on ΔVT and other key features of the device. It also serves for compact modeling of high-k gate dielectric MOSFETs.
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