Modeling and Analysis for MOS Capacitance of TSV Considering Temperature Dependence

Qiu Min,Er-Ping Li,Jian-Ming Jin
DOI: https://doi.org/10.23919/emctokyo.2019.8893953
2019-01-01
Abstract:This paper presents a comprehensive modeling and analysis for the metal-oxide-semiconductor (MOS) capacitance of through silicon via in consideration of the temperature dependence. The MOS effect is physically modeled by a Poisson-Boltzmann equation with the distribution of mobile charge carriers included. Temperature-dependent parameters considered in the analysis are the intrinsic carrier density, permittivity, and bandgap of the silicon. With the equation solved, the variations of MOS capacitance with the bias voltage, operating frequency, oxide charge, and temperature can be obtained. The calculated MOS capacitances under different temperature show a good agreement with the measurement results, which verifies the accuracy of the presented modeling and analysis.
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