Electronic Structures of Strained Layer Superlattices (Si)m/(Si1-xGex)m(100) with m=1 and m=2n (n=1-10)

Xide Xie,Dingli Shen,Kaiming Zhang
DOI: https://doi.org/10.1007/978-3-642-74218-7_34
1988-01-01
Abstract:The empirical tight-binding method is used to calculate the electronic structures of type-II strained layer superlattices (Si)m/ (Si1−xGex)m(100) with m = 1 and m = 2n (n=1−10). Band folding is found to play an important role for the Si-like characteristics of strained Si/Ge, particularly for the quasi-direct gap of (Si)2n/(Ge)2n when n>5. The electronic property of the strained monolayer (Si)1/(SiGe)1 is an intermediate case between that of the bulk zincblende semiconductor and the ordinary semiconductor superlattices.
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