Electronic Structure of (111)-Oriented Strained-Layer SiGe Superlattice

Gu Binglin,Duan Wenhui,Zhu Jialin,Wang Mingliang
DOI: https://doi.org/10.1088/0256-307X/9/4/009
1992-01-01
Chinese Physics Letters
Abstract:Using the first-principle self-consistent linear-muffin-tin-orbital method within the local density approximation, band structure of (111)-oriented strained-layer SiGe superlattice is studied. Three different ordered arrangements of atom layers (Si-Ge?Si-Ge Si-Si?Ge-Ge and Si?Si-Ge?Ge) are considered. Calculated results indicate that (111)-oriented SiGe strained layer superlattices are semiconductive, with a band gap about 1.0eV. The first two superlattices are indirect band gap semiconductors, and the third one (Si?Si-Ge?Ge) is a direct band gap semiconductor. The influence of strain on the band structure is also investigated.
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