Investigation On The Formation Mechanism Of P-Type Li-N Dual-Doped Zno

Bing Zhang,Bin Yao,Yongfeng Li,Zhenzhong Zhang,Bing Li,Chongxin Shan,Dongxu Zhao,Dezhen Shen
DOI: https://doi.org/10.1063/1.3518059
IF: 4
2010-01-01
Applied Physics Letters
Abstract:Lithium and nitrogen dual-doped ZnO films [ZnO:(Li,N)] with Li concentrations of 0%-11.2% were grown on sapphire by plasma-assisted molecular beam epitaxy, and a stable p-type ZnO:(Li, N) film was obtained by doping 6.1% of Li. The p-type conductivity of ZnO:(Li, N) is attributed to the formation of the Li(i)-N(O) complex, which depresses the compensation of Li(i) donor for Li(Zn) acceptor and the generation of (N(2))(O) donors. It is demonstrated that the Lii-NO complex can form an impurity band above the valance band maximum, resulting in a decrease in the ionization energy of the acceptor and an improvement in the conductivity and stability of the p-type ZnO:(Li, N). (C) 2010 American Institute of Physics. [doi:10.1063/1.3518059]
What problem does this paper attempt to address?