Formation of a Single-Layer Si Nanostructure and Its Luminescence Characteristics

Zhanhong Cen,Jun Xu,Xin Li,Wei Li,San Chen,Yansong Liu,Xinfan Huang,Kunji Chen
DOI: https://doi.org/10.3321/j.issn:0253-4177.2006.06.012
2006-01-01
Abstract:Silicon nanostructures with high density (up to 1011 cm-2) and with a lateral size of 10-30 nm and a vertical size limited by the film thickness are fabricated on insulating SiNx layers by combining laser irradiation on an ultrathin (4-30 nm) amorphous Si film and subsequent thermal annealing. Atomic force microscopy, transmission electron microscopy, and Raman scattering spectroscopy are employed to characterize the surface morphology, crystallization process' and crystallite. The influence of the laser irradiation and the thickness of the initial amorphous Si layer on the formation of the Si nanostructures is studied. A strong photoluminescence with a peak located at about 660 nm, which we tentatively attribute to the crystalline Si grains, can be detected from the 5 nm thick crystallized sample.
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