Fabrication and Luminescence Properties of Si Quantum Dots Based on Si-Rich Sinx/N-Rich Siny Multilayer

Huang Rui,Wang Dan-Qing,Song Jie,Ding Hong-Lin,Wang Xiang,Guo Yan-Qing,Chen Kun-Ji,Xu Jun,Li Wei,Ma Zhong-Yuan
DOI: https://doi.org/10.7498/aps.59.5823
IF: 0.906
2010-01-01
Acta Physica Sinica
Abstract:SiN-based multilayers were prepared in a plasma enhanced chemical vapor deposition system followed by subsequently thermal annealing and laser irradiation with the aim of fabrication three-dimensional constrained, size-controlled and well-regulated Si nanocrystals. The experimental results show that Si nanocrystals grow in the Si-rich SiN sublayer. Furthermore, the grain size can be controlled according to the thick of Si-rich SiN. It is also found that the crystalline fraction of the multilayers irradiated by laser is significantly higher than that by thermal annealing. The devices that employing the laser-irradiated multilayer as luminescent active layer exhibit an enhanced visible electroluminescence and the external quantum efficiency is improved by 40% in comparison with the device without annealing.
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