Influence of Si Crystallization Evolution on 1.54 Μm Luminescence in Er-doped Si/Al2O3 Multilayer

Wang Jun-Zhuao,Shi Zhuo-Qiong,Lou Hao-Nan,Zhang Xin-Luan,Zuo Ze-Wen,Pu Lin,Ma En,Zhang Rong,Zheng You-Liao,Lu Fang,Shi Yi
DOI: https://doi.org/10.7498/aps.58.4243
IF: 0.906
2009-01-01
Acta Physica Sinica
Abstract:The crystallization evolution of the nanostructured Si (ns-Si) in the Er-doped Si/Al 2 O 3 multilayer fabricated by using pulsed laser deposition technique and its effects on the Er 3+ luminescence at 1.54 μm are investigated. Raman scattering and transmission electron microscopy measurements are used to characterize the microstructure evolution of the ns-Si during annealing treatment processes. The maximum photoluminescence intensity is obtained in the sample with ultrathin ns-Si sublayers annealed at 600—700 ℃, where the density, the size of Si nanocrystals, the interaction distance, and the optimized local environment for effectively activating the Er 3+ are well controlled. From the analysis of the decay process of time-dependent luminescence, two decay channels are considered, the fast and slow decay channels. The bulk-like Si is responsible for the fast process and the Si nanocrystals are responsible for the slow decay process.
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