Efficient Sensitized Photoluminescence of Er Silicate in Silicon Oxide Films Embedded with Amorphous Silicon Clusters, Part I: Fabrication

Yuhan Gao
DOI: https://doi.org/10.1364/ome.9.004329
2019-01-01
Optical Materials Express
Abstract:We have investigated the structural evolution of Si-rich Er silicate films. Er silicate layers embedded with amorphous silicon (a-Si) clusters are formed upon the annealing above 1000 degrees C of Er-doped Si-rich SiO2 films with high Er concentrations. It is tbund that the crystallization of Er silicates annealed at higher temperatures leads to the disappearance of Si-NCs formed at 900 degrees C. On the other hand, the interface between Er silicate and embedded a-Si clusters increases the nucleation barrier for Si-NCs in these clusters. A two-step annealing process is utilized to obtain a fine structure and a good crystal quality of Er silicates at the same time, which will benefit the sensitized photoluminescence of Er silicates. (C) 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement
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