Abstract:In this study, silicon micro/nanostructures of controlled size and shape are fabricated by chemical-etching-assisted femtosecond laser single-pulse irradiation, which is a flexible, high-throughput method. The pulse fluence is altered to create various laser printing patterns for the etching mask, resulting in the sequential evolution of three distinct surface micro/nanostructures, namely, ring-like microstructures, flat-top pillar microstructures, and spike nanostructures. The characterized diameter of micro/nanostructures reveals that they can be flexibly tuned from the micrometer (∼2 μm) to nanometer (∼313 nm) scales by varying the laser pulse fluence in a wide range. Micro-Raman spectroscopy and transmission electron microscopy are utilized to demonstrate that the phase state changes from single-crystalline silicon (c-Si) to amorphous silicon (a-Si) after single-pulse femtosecond laser irradiation. This amorphous layer with a lower etching rate then acts as a mask in the wet etching process. Meanwhile, the on-the-fly punching technique enables the efficient fabrication of large-area patterned surfaces on the centimeter scale. This study presents a highly efficient method of controllably manufacturing silicon micro/nanostructures with different single-pulse patterns, which has promising applications in the photonic, solar cell, and sensors fields.

An approach to obtain single layer of nanostructured Si by laser irradiation on ultrathin amorphous Si films

Formation of a Dense Nanocrystalline Si Array on an Insulating Layer by Laser Irradiation of Ultrathin Amorphous Si Films

Preparation of a Single Layer of Luminescent Nanocrystalline Si Structures by Laser Irradiation Method

Laser Induced Surface Nanostructuring on Ultra-Thin Amorphous Si Films

High Density Si Nanodots-Fabrication and Properties

Formation of a Single-Layer Si Nanostructure and Its Luminescence Characteristics

Two-Dimensional Patterned Nanocrystalline Si Array Prepared by Laser Interference Crystallization of Ultra-Thin Amorphous Si : H Single-Layer

Visible Light Emission From Single Layer Si Nanodots Fabricated By Laser Irradiation Method

Laser microstructuring of Si surfaces for low-threshold field-electron emission

Patterned Structures of Silicon Nanocrystals Prepared by Pulsed Laser Interference Crystallization of Ultra-Thin A-Si : H Single-Layer

Formation and properties of high density Si nanodots

Formation of the Patterned Nanocrystalline Si by Pulsed-Laser Interference Crystallization of A-Si:H Thin Films

Patterned structures of silicon nanocrystals prepared by laser annealing

Three-Dimensional Ordered Nano-Crystalline Si Made by Pulsed Laser Interference Crystallization of A-Si : H/A-Sinx : H Multilayers

Patterned Distribution Of Silicon Nanocrystals Prepared By Pulsed Laser Interference Crystallization Of An Ultrathin A-Si : H Single Layer

Microstructure properties of nanocrystalline silicon/SiO2 multilayers fabricated by laser-induced crystallization

Electron Field Emission of Nanocrystalline Si Prepared by Laser Crystallization

One-Dimensional Periodic Nanocrystalline Silicon Arrays Made by Pulsed Laser Interference Crystallization

The Formation of High-Density Uniform Silicon Nanocrystals on Insulator Substrate and Their Surface Morphology

Controllable Si (100) Micro/nanostructures by Chemical-Etching-assisted Femtosecond Laser Single-Pulse Irradiation

Research on Monocrystalline Silicon Micro-Nano Structures Irradiated by Femtosecond Laser.