Monte Carlo Simulation Of Hole Non-Stationary Transports In Utb Soi Rpmosfet

G Du,Xy Liu,Zl Xia,Rq Han
DOI: https://doi.org/10.1109/icsict.2004.1436673
2004-01-01
Abstract:UTB SOI device as a kind of no-conventional structure:, are hope to Like place of conventional CMOS in near future. Many works have been done on this kind devices but rarely work has investigated the non-stationary transports effect in pMOSFET. In this paper, hole transports in UTB SOI pMOSFET are studied by using 2-D full band ensemble Monte Carlo device simulator. The hole non-stationary transport effect is important in sub-100nm UTB device. The hole velocity overshooting make the device performance keep increasing as channel length scaling down. The UTB SOI pMOSFETs shown better scalability than nMOSFETs.
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