Revealing the Scattering Mechanisms of Mobility Degradation in Ultrathin Body SOI Pmosfets
Jin Shao,Rui Su,Fang Liu,Bo Wu,Yongfeng Deng,Xinyi Zhang,Dawei Gao,Junkang Li,Rui Zhang
DOI: https://doi.org/10.1109/icicdt63592.2024.10717787
2024-01-01
Abstract:The carrier scattering mechanisms of mobility degradation in ultrathin body (UTB) SOI pMOSFETs have been experimentally investigated using different channel thicknesses. It is confirmed that, when the Si layer thickness is between 2 nm and 5 nm, the hole mobility constrained by phonon scattering $(\mu_{\text{ph}})$ exhibits a marked reduction as the thickness diminishes, while the thickness fluctuation scattering limited mobility $(\mu_{\mathrm{t}\mathrm{f}})$ still exhibits a traditional dependence of TSi 6 . However, as the Si thickness decreases further, the hole mobility becomes predominantly governed by thickness fluctuation scattering. These findings offer a revised model to enhance the understanding of carrier transport in thin-channel Si devices, crucial for future advanced technology nodes.