Monte Carlo Simulation of Band-to-band Tunneling in Silicon Devices

Zhiliang Xia,Gang Du,Yuncheng Song,Jian Wang,Xiaoyan Liu,Jinfeng Kang,Ruqi Han
DOI: https://doi.org/10.1143/jjap.46.2023
IF: 1.5
2007-01-01
Japanese Journal of Applied Physics
Abstract:A band-to-band tunneling model including trap-assisted tunneling has been implemented in our ensemble full band Monte Carlo simulator. Four kinds of band-to-band tunneling mechanisms are taken into account. All the parameters in the band-to-band tunneling model are verified by comparing the pn junction reverse current with the experimental data. Then, gate-induced-drain-leakage currents caused by band-to-band tunneling in a 45 nm gate length n-metal–oxide–semiconductor field-effect-transistor are investigated. Results indicate that band-to-band tunneling can cause additional hot holes which becomes an important issue for the device reliability. Moreover, The gate-induced-drain-leakage currents caused by band-to-band tunneling in parallel with Si/SiO2 interface and normal to Si/SiO2 interface are compared. The influence of drain voltage on the two components of the gate-induced-drain-leakage currents is considered.
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