Extraction of polarization-induced charge density in modulation-doped Alx Ga1-x N/GaN heterostructure through the simulation of the Schottky capacitance-voltage characteristics

Yugang Zhou,Bo Shen,Jie Liu,HuiMei Zhou,Huiqiang Yu,Rong Zhang,Yi Shi,Youdou Zheng
DOI: https://doi.org/10.7498/aps.50.1774
2001-01-01
Abstract:Polarization-induced charge density in modulation-doped Alx Ga1-x N/GaN heterostructures is extracted through the simulation of the Schottky Capacitance-Voltage (C-V) characteristics. C-V measurements were made on Pt Schottky contacts on modulation-doped Al0.22Ga0.78 N/GaN heterostructures. The C-V characteristics were simulated numerically using the three-dimensional Fermi model. Influence of sample parameters on C-V characteristics is analized by the simulation. Polarization-induced charge density, n-AlGaN doping level and Schottky barrier height have different influences on the C-V characteristics, and thus the polarization-induced charge density can be extracted accurately. The polarization-induced sheet charge density at the heterointerface is extracted to be 6.78 × 1012 cm-2 in the Al0.22 Ga0.78 N/GaN heterostructure with the Al0.22 Ga0.78 N thickness of 45nm. This work provides a method for quantitative analysis of the polarization-indeced charge in modulation-doped AlxGa1-x N/GaN heterostructures.
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