Influence of ferroelectric polarization on the properties of two-dimensional electron gas in Pb(Zr0.53Ti0.47)O 3/AlxGa1-xN/GaN structures

Bo Shen,Wei-ping Li,Takao Someya,Zhao-xia Bi,Jie Liu,Hui-mei Zhou,Rong Zhang,Feng Yan,Yi Shi,Zhi-guo Liu,You-dou Zheng,Yasuhiko Arakawa
DOI: https://doi.org/10.1143/JJAP.41.2528
2002-01-01
Abstract:An AlxGa1-xN/GaN-based metal-ferroelectric-semiconductor (MFS) structure is developed by deposit in g a Ph(Zr0.53Ti0.47)O-3 film on a modulation-doped Al0.22Ga0.78N/GaN heterostructure. In high-frequency capacitance voltage (C-V) measurements. the sheet density of the two-dimensional electron gas at the Al0.22Ga0.78N/GaN interface in the MFS structure decreases from 1.56 x 10(13) cm(-2) to 5.6 x 10(12) cm(-2) under the -10 V applied bias. A ferroelectric C-V window, 0.2 V in width, is observed near the -10 V bias, indicating that the AlxGa1-xN/GaN MFS structure can achieve memory performance without the reversal of the ferroelectric polarization. AlxGa1-xN/GaN heterostructures are promising semiconductor channel candidates for MFS field-effect transistors.
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