Fabrication and Investigation of the Metal-Ferroelectric-Semiconductor Structure with Pb(Zr0.53Ti0.47)O3 on AlxGa1-xN/GaN Heterostructures

Shen B.,Li W.P.,Wang X. S.,Yan F.,Zhang R.,Bi Z.X.,Shi Y.,Liu Z. G.,Zheng Y. D.,University of Tokyo
DOI: https://doi.org/10.1557/proc-693-i11.41.1
2001-01-01
MRS Proceedings
Abstract:An Al x Ga 1−x N/GaN-based metal-ferroelectric-semiconductor (MFS) structure is developed by depositing a Pb(Zr 0.53 Ti 0.47 )O 3 film on a modulation-doped Al 0 22 Ga 0.78 N/GaN heterostructure. In high-frequency capacitance-voltage (C-V) measurements, the sheet concentration of the two-dimensional electron gas at the Al 0.22 Ga 0.78 N/GaN interface in the MFS structure decreases from 1.56 × 10 13 cm −2 to 5.6 × 10 12 cm −2 under the −10 V applied bias. A ferroelectric C-V window of 0.2 V in width near −10V bias is observed, indicating that the Al x Ga 1−x N/GaN MFS structure can achieve memory performance without the reversal of the ferroelectric polarization. The results indicate that Al x Ga 1−nx N/GaN heterostructures are promising semiconductor channel candidates for MFS field effect transistors.
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