Band alignment and polarization engineering in κ-Ga2O3/GaN ferroelectric heterojunction

Yanting Chen,Hongkai Ning,Yue Kuang,Xing-Xing Yu,He-He Gong,Xuanhu Chen,Fang-Fang Ren,Shulin Gu,Rong Zhang,Youdou Zheng,Xinran Wang,Jiandong Ye
DOI: https://doi.org/10.1007/s11433-022-1907-9
2022-06-06
Science China: Physics, Mechanics and Astronomy
Abstract:Ferroelectric-semiconductor heterostructures offer an alternative strategy to manipulate polarization towards advanced devices with engineered functionality and improved performance. In this work, we report on the heteroepitaxial construction, band structure alignment and polarization engineering of the single-phased κ -Ga 2 O 3 /GaN ferroelectric/polar heterojunction. A type-II band alignment is determined at the κ -Ga 2 O 3 /GaN polar hetero-interface, with a valence band offset of (1.74 ± 0.1) eV and a conduction band offset of (0.29 ∓ 0.1) eV. Besides the band edge discontinuity, charge dipoles induced by spontaneous polarization lead to the observed band bending with built-in potentials of 0.9 and 0.33 eV, respectively, at the κ -Ga 2 O 3 surface and κ -Ga 2 O 3 /GaN interface. The polarization switching properties of ferroelectric κ -Ga 2 O 3 are identified with a remanent polarization of approximately 2.7 μC/cm 2 via the direct hysteresis remanent polarization/voltage (P-V) loop measurement. These findings allow the rational design of κ -Ga 2 O 3 ferroelectric/polar heterojunction for the application of power electronic devices, advanced memories and even ultra-low loss negative capacitance transistors.
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