Fabrication of a novel structural miniature silicon condenser microphone

Quanbo Zou,Litian Liu,Zhijian Li
1997-01-01
Tien Tzu Hsueh Pao/Acta Electronica Sinica
Abstract:A novel type of silicon condenser microphone with corrugated diaphragm has been designed, fabricated and tested. The microphone can be fabricated on a single wafer by using silicon anisotropic etching and sacrificial layer etching techniques. The introduction of well performed corrugation has strongly increased the mechanical sensitivity of the microphone diaphragm because of the reduction of the stress in thin films. Corrugations with different q values have been investigated, showing a close relationship between the ratio of the depth of the corrugation to the diaphragm thickness and the mechanical sensitivity of the diaphragm. For the purpose of further decreasing thin film stress, composite diaphragm has been fabricated, reducing the initial stress to a much lower level of about 70MPa in tension. Three types of corrugation placements in a diaphragm area of 1mm2 have been fabricated. Microphones with higher than 10kHz bandwidth and sensitivity of 6.8-16.0mV/Pa under a relatively low bias voltage of about 5-15V have been fabricated. The experiments prove that the corrugation technique is promising for silicon condenser microphone.
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