Research on Bulk Silicon Etching for Piezoelectric Miniature Microphone and Capacitive Miniature Microphone

JIA Ze,YANG Yi,CHEN Jing,LIU Jian-she,REN Tian-ling,LIU Li-tian
DOI: https://doi.org/10.3969/j.issn.1004-2474.2006.01.037
2006-01-01
Abstract:Both miniature microphone with PZT Piezoelectric thin films prepared by Sol-Gel method and the one with capacitive corrugated diaphragms are silicon-based single-chip miniature microphone based on MEMS.Bulk silicon etching is executed after surface micromachining processes in the fabrication of silicon microphone,which causes new fabrication problems of the protection for the front side of the wafer and control of bulk silicon etching.These are researched and resolved by several methods of protection for the front side of the wafer and techniques of self-halt for etching.An open circuit sensitivity of 20~40 mV/Pa in audio frequency has been achieved,and fabrication runs have been conducted with the yield reaching upon 70%
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