Capacitance Characteristics of the Mos Structure with Fowler-Nordheim Tunneling Current

YD He,MZ Xu,CH Tan,YY Wang
DOI: https://doi.org/10.1109/icsict.1995.499641
1995-01-01
Abstract:In this paper, it was noted that the transient C-t characteristics under high gate voltage was different from the normal one under a lower gate voltage, and that the equilibrium capacitance (C-t) decreased when the applied gate voltage increased. Here, we present a new model that is able to explain the phenomena of a pulsed MOS structure with Fowler-Nordheim tunneling current.
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