Tunneling Field-Effect Transistor: Capacitance Components and Modeling

Yue Yang,Xin Tong,Li-Tao Yang,Peng-Fei Guo,Lu Fan,Yee-Chia Yeo
DOI: https://doi.org/10.1109/led.2010.2047240
IF: 4.8157
2010-07-01
IEEE Electron Device Letters
Abstract:We report a numerical simulation study of gate capacitance components in a tunneling field-effect transistor (TFET), showing key differences in the partitioning of gate capacitance between the source and drain as compared with a MOSFET. A compact model for TFET capacitance components, including parasitic and inversion capacitances, was built and calibrated with computer-aided design data. This model should be useful for further investigation of performance of circuits containing TFETs. The dependence of gate–drain capacitance $C_{\rm gd}$ on drain design and gate length was further investigated for reduction of switching delay in TFETs.
engineering, electrical & electronic
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