Capacitance Modeling with Charge Partitions Covering Full-Region Operations of TFETs

Fangxing Zhang,Wu Dai,Kaifeng Wang,Yu Li,Baokang Peng,Hongyan Han,Ye Ren,Yongqin Wu,Weihai Bu,Qianqian Huang,Runsheng Wang,Lining Zhang,Ru Huang
DOI: https://doi.org/10.1109/ted.2024.3403801
IF: 3.1
2024-01-01
IEEE Transactions on Electron Devices
Abstract:An accurate physics-based capacitance model is developed covering full-region operations of silicon TFET (Si-TFET) with all biasing conditions. The intrinsic and parasitic capacitances are modeled by the surface-potential-based method and justified by calibrated TCAD simulations. To address the challenges of a classical physics-based model in calculating the charge partitions, an artificial neural network (ANN)-enhanced method is proposed to capture the terminal partition strategy, which features good smoothness and high accuracy. The results show a source terminal partition of the ambipolar region in the range of 90%–100%, and the drain partition of the normal region is in the range of 85%–100%, with in-between partitions of the transition regions. This ANN-enhanced physics-based model addresses the requirements of a TFET channel charge partition strategy and has been verified in circuit simulations with improved accuracy.
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