Analytical Model for High Current Density Trench Gate Mosfet

KGP Dharmawardana,GAJ Amaratunga
DOI: https://doi.org/10.1109/ispsd.1998.702712
1998-01-01
Abstract:An analytical model for the trench gate MOSFET is presented. It consists of a more accurate model for the inversion channel region, which considers the effects of doping variation, transverse and longitudinal electric fields on electron mobility. In addition, it also accurately incorporates the feature of current transfer from the accumulation channel region into the n-drift region. The model presented and validated by numerical simulation results can be useful in the initial design of optimum device structures
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