A MOS Quantum Tunneling Analytical Model Based on Theory of Density Gradient

LIU Yao,YU Zhiping
2011-01-01
Abstract:A physics-based analytical model for quantum tunneling through ultra-thin oxide in MOS capacitor was developed.Quantum mechanical effects were demonstrated by solving density gradient equations with singular perturbation method.By simultaneously solving Poisson's equation and quantum-corrected electron potential equation,electron and electrostatic potential distributions perpendicular to the channel were obtained.Results captured the features of quantum effects and were shown to be quite different from what the classical physics predicts.Comparison between results predicted by analytical model and those from numerical simulation showed good agreement over a broad range of gate biases and oxide thickness.
What problem does this paper attempt to address?