p-type ZnO films by codoping of nitrogen and aluminum and ZnO-based p–n homojunctions

J.G. Lu,L.P. Zhu,Z.Z. Ye,F. Zhuge,B.H. Zhao,J.Y. Huang,L. Wang,J. Yuan
DOI: https://doi.org/10.1016/j.jcrysgro.2005.05.079
IF: 1.8
2005-01-01
Journal of Crystal Growth
Abstract:N–Al codoped p-type ZnO thin films have been characterized. The resistivity can be lowered to 2.6Ωcm, and the p-type conductivity is reproducible and stable. The co-doped films possess good crystal quality with high (002) orientation and prominent UV emission around 3.14eV at room temperature. The two-layer-structure ZnO p–n homojunctions were fabricated on a sapphire substrate by depositing the N–Al codoped p-type ZnO film on the Al-doped n-type ZnO film. The current–voltage (I–V) characteristics exhibit the inherent and acceptable rectifying behavior for the p-ZnO:(N,Al)/n-ZnO:Al homojunctions.
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