Abstract:We report on p-type Ag-doped ZnMgO thin films prepared on quartz substrates by pulsed laser deposition. The effects of substrate temperature on the structural, electrical and optical properties of the films are investigated in detail. All the films we obtained have a preferred orientation with the c-axis perpendicular to the substrates. Secondary ion mass spectroscopy and X-ray photoelectron spectroscopy measurements confirm that Ag has been incorporated into the films and principally occupies Zn site in the state of Ag+ ion and acts as an acceptor. An acceptable p-type conduction, with a resistivity of 24.96Ωcm, a Hall mobility of 0.32cm2V−1s−1, and a hole concentration of 7.89×1017cm−3 at room temperature, was obtained for the film grown at the optimal substrate temperature of 400°C. The formation of good p-type conduction in this film might be due to a combined effect of the increase of substitutional-Ag (AgZn) density and the suppression of the oxygen-related defects. The p-type conduction of Ag-doped ZnMgO film is further confirmed by a rectifying Ag-doped ZnMgO/i-ZnO/Al-doped ZnMgO heterojunction.

Preparation and Characteristics of P-Type Zno Films by Dc Reactive Magnetron Sputtering

Roles of Hydrogen and Nitrogen in P-Type Doping of ZnO

Preparation and Characteristics of p-Type ZnO Films Using Al and N Codoping Method by DC Reactive Magnetron Sputtering

Preparation and Properties of N-Doped P-Type ZnO Films by Solid-Source Chemical Vapour Deposition with the C -Axis Parallel to the Substrate

Hydrogen‐assisted Nitrogen‐acceptor Doping in ZnO

P-Type Zno Films Deposited by Dc Reactive Magnetron Sputtering at Different Ammonia Concentrations

P-Type ZnO Thin Films Fabricated by Dc Magnetron Reactive Sputtering Method at Different Substrate Temperatures

p-Type conduction in Al–N co-doped ZnO films

Preparation of P-Type ZnO Films by Al+N-codoping Method

Growth and Characteristics of p-Type ZnO Films Doped with Al and N

Preparation and Characteristic of P-Type ZnO Films by Al–N Codoping Technique

Properties of N-doped ZnO thin films in annealing process

Fabrication of P-Type ZnO Thin Films Via DC Reactive Magnetron Sputtering by Using Na As the Dopant Source

Structural, electrical and optical properties of N-doped ZnO films synthesized by SS-CVD

Effect of Oxygen Partial Pressure Ratios on the Properties of Al–N Co-Doped ZnO Thin Films

P-Type Conductivity and Stability of Nitrogen-Doped Zinc Oxide Prepared by Magnetron Sputtering

Deposition of Al-N Co-doped p-type Zn0.95Mg0.05O thin films

Preparation and Characterization of p-Type ZnO Using Li-N Dual-Acceptor Doping Method by Pulsed Laser Deposition

Fabrication and Characteristics of the Low-Resistive P-Type ZnO Thin Films by DC Reactive Magnetron Sputtering

Preparation and Properties of P-Type Ag-doped ZnMgO Thin Films by Pulsed Laser Deposition