Abstract:Physical properties of ZnO thin films are of great importance for their potential application. In this paper, we reported the electrical and optical properties of undoped ZnO films with a high dependence oil the nucleation and growth kinetics. These ZnO films were deposited on glass substrates within the temperature range of 250-350 degrees C by pulsed-spray evaporation chemical vapor deposition (PSE-CVD). X-ray diffraction (XRD) shows that ZnO films grow in the c-axis orientated hexagonal structure. The inspection of the surface morphology with scanning electron micrographs (SEM) shows a substantial effect of the growth temperature, which was directly correlated with the nucleation kinetics. A comprehensive nucleation and growth process was also proposed for the interpretation of changeable film morphology and corresponding electrical conductivity. The films deposited at intermediate growth temperatures of 310-340 degrees C show compact structures and consequent high electrical conductivity, Which Was Still improved with increase of film thickness. Ill contrast to the electrical conductivity, the optical hand gal) rather shows a correlation with the size of the crystals forming the films rather than with their arrangement. The band gap energy decreases from 3.56 to 3.42 eV toward the bulk value Upon the increase of the crystallite size from 15 to 30 nm.

Growth of Nitrogen-Doped P-Type ZnO Films by Spray Pyrolysis and Their Electrical and Optical Properties

Effect of Nucleation and Growth Kinetics on the Electrical and Optical Properties of Undoped ZnO Films

The growth of nanoscale ZnO films by pulsed-spray evaporation chemical vapor deposition and their structural, electric and optical properties

Roles of Hydrogen and Nitrogen in P-Type Doping of ZnO

Hydrogen‐assisted Nitrogen‐acceptor Doping in ZnO

Growth and Electric Characteristics of p-Type N-Doped ZnO Film by Metal-Organic Chemical Vapor Deposition

Structural, electrical and optical properties of N-doped ZnO films synthesized by SS-CVD

Synthesis and Properties of P-Type Nitrogen-Doped ZnO Thin Films by Pulsed Laser Ablation of a Zn-rich Zn3N2 Target

High Quality P-Type Zno Films Grown by Low Pressure Plasma-Assisted Mocvd with N2o Rf Plasma Doping Source

Electrical Properties of Al+N Co-doped p-type ZnO Films

Electrical and Optical Properties of Al–N Co-Doped P-Type Zinc Oxide Films

Preparation and Properties of N-Doped P-Type ZnO Films by Solid-Source Chemical Vapour Deposition with the C -Axis Parallel to the Substrate

Growth and Characteristics of p-Type ZnO Films Doped with Al and N

Study on the Hall-effect and Photoluminescence of N-doped P-Type ZnO Thin Films

Preparation and Characteristics of P-Type Zno Films by Dc Reactive Magnetron Sputtering

Electrical And Structural Properties Of P-Type Zno : N Thin Films Prepared By Plasma Enhanced Chemical Vapour Deposition

High Quality P-Type Zno Film Growth by A Simple Method and Its Properties

Effects of Growth Ambient on Electrical Properties of Al–N Co-Doped P-Type ZnO Films

Optical properties of p-type ZnO doped by lithium and nitrogen

Preparation and Characterization of N Doped P-type MgZnO Film

Nitrogen doped ZnO film grown by the plasma-assisted metal-organic chemical vapor deposition