Observation of Coulomb-blockade in a field-effect transistor with silicon nanocrystal floating gate at room temperature

H Qin,X Gu,H Lu,J Liu,X Huang,K Chen
DOI: https://doi.org/10.1016/S0038-1098(99)00177-5
IF: 1.934
1999-01-01
Solid State Communications
Abstract:In a field-effect transistor (FET), six single electron-tunneling events and the corresponding electron storage in silicon nanocrystals were observed at room temperature. The device is a metal-oxide-semiconductor field-effect transistor (MOSFET) with an electron channel 5 mu m in length, 10 IJ mu m in width, and an array of silicon-oxide passivated silicon nanocrystals as the multiple-nanocrystal floating gate. The layer of silicon nanocrystals with an average size of 5 nm is prepared by plasma enhanced chemical vapor deposition (PECVD) method using high-hydrogen diluted silane and followed by thermal treatment. Because of the ultra-small electric capacitance (about 4.6 x 10(-2) aF) between the control gate and a single nanocrystal, the tunneling of electrons from the channel to the nanocrystals is regulated by the Coulomb-blockade effect. The addition of one more electron per nanocrystal leads to the oscillation of the drain-source current with a period of 3.8 V and causes a shift of 1.3 V in the threshold voltage. The duration of the electron storage in the nanocrystal is longer than 20 min. (C) 1999 Elsevier Science Ltd. All rights reserved.
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