TCAD SIMULATION OF SELBOX AND DSOI CMOS SRAM FAILURE

Dmitry Popov,
DOI: https://doi.org/10.29003/m1608.silicon-2020/227-229
2020-09-09
Abstract:A mixed TCAD-SPICE simulation of the heavy ion impact into a SRAM on SOI CMOS transistors was carried out. The dependence of the threshold LET on temperature was investigated for three configurations of 0.24 μm SOI MOSFET: traditional SOI, Selective BOX and Double SOI. The radiation hardness of SRAM on Double SOI MOSFETs is significantly improved by applying a negative bias to the additional silicone layer has been shown.
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