Simulation of SEU Response of Advanced 20 Nm FDSOI SRAMs

Chang Cai,Luchang Ding,Ze He,Jian Yu,Jie Liu,Jiyuan Bai,Gengsheng Chen,Jun Yu
DOI: https://doi.org/10.1109/asicon52560.2021.9620488
2021-01-01
Abstract:FDSOI technology has attracted considerable interests in radiation environments for its inherent high SEU tolerance, especially for the advanced nanoscale devices. Hence, the 20 nm basic 6-T SRAM and SEU hardened 8-T SRAM based on the platform of UTBB FDSOI process are set up and simulated by the calibrated double exponential current pulses to fully characterize the SEU sensitivities. A low SEU threshold of 6-T SRAM and an at least ~×20 improvement of SEU threshold of 8-T SRAM are observed. And the calculated radiation resistance of the SRAMs is closely related to the injection nodes. The improved SEU threshold for the 20 nm 8-T SRAM unit is significant for the application of radiation hardened FDSOI SRAMs in space missions.
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