Abstract:The carbon-based micro/nano electromechanical system (MEMS/NEMS) technique provides a powerful approach to large-scale manufacture of high-aspect-ratio carbon structures for wafer-level processing. The fabricated three-dimensional (3D) carbon structures have the advantages of excellent electrical and electrochemical properties, and superior biocompatibility. In order to improve their performance for applications in micro energy storage devices and microsensors, an increase in the footprint surface area is of great importance. Various approaches have been proposed for fabricating large surface area carbon-based structures, including the integration of nanostructures such as carbon nanotubes (CNTs), graphene, nanowires, nanofilms and nanowrinkles onto 3D structures, which has been proved to be effective and productive. Moreover, by etching the 3D photoresist microstructures through oxygen plasma or modifying the photoresist with specific materials which can be etched in the following pyrolysis process, micro/nano hierarchical carbon structures have been fabricated. These improved structures show excellent performance in various applications, especially in the fields of biological sensors, surface-enhanced Raman scattering, and energy storage devices such as micro-supercapacitors and fuel cells. With the rapid development of microelectronic devices, the carbon-based MEMS/NEMS technique could make more aggressive moves into microelectronics, sensors, miniaturized power systems, etc. In this review, the recent advances in the fabrication of micro/nano hierarchical carbon-based structures are introduced and the technical challenges and future outlook of the carbon-based MEMS/NEMS techniques are also analyzed.

Fabrication of GaN-based MEMS Structures Using Dry-Etch Technique

Fabrication of suspending gan microstructures with combinations of anisotropic and isotropic dry etching techniques

Gan on Patterned Silicon (gps) Technique for Fabrication of Gan-Based Mems

Fabrication of Large-Area Suspended MEMS Structures Using GaN-on-Si Platform

Fabrication of Position-controllable GaN Nanostructures

Fabrication of Diamond Microstructures by Using Dry and Wet Etching Methods

SiN-masked GaN-on-patterned-silicon (GPS) Technique for Fabrication of Suspended GaN Microstructures

Transfer of III-nitride epitaxial layers onto pre-patterned silicon substrates for the simple fabrication of free-standing MEMS

Fabricating Processes Of Free-Standing Silicon Nitride Thin Film For Mems Devices

GaN on Patterned Silicon (GPS) Technique for GaN-based Integrated Microsensors

Fabrication of low stress GaN-on-diamond structure via dual-sided diamond film deposition

Tuning the interlayer microstructure and residual stress of buffer-free direct bonding GaN/Si heterostructures

Characterization of AlGaN/GaN cantilevers fabricated with deep-release techniques

Fabrication of High-Quality and Strain-Relaxed GeSn Microdisks by Integrating Selective Epitaxial Growth and Selective Wet Etching Methods

Effect of backside dry etching on the device performance of AlGaN/GaN HEMTs

Nanostructures and Nanodevices Special Fabrication and Characterization

Preparation and Characterization of GaN Micro/nano-Structures by the Electrodeless Photo-Assisted Chemical Etching

Optimization of the GaAs-on-Si Substrate for Microelectromechanical Systems (MEMS) Sensor Application

Optimization and Fabrication of MEMS suspended structures for nanoscale thermoelectric devices

Scalable fabrication of carbon-based MEMS/NEMS and their applications: a review