Abstract:Most MEMS devices are currently based on silicon because of the available surface machining technology. However, Si has poor mechanical and tribological properties which makes it difficult to produce high performance Si based MEMS devices that could work reliably, particularly in harsh environments; diamond, as a superhard material with high mechanical strength, exceptional chemical inertness, outstanding thermal stability and superior tribological performance, could be an ideal material for MEMS. A key challenge for diamond MEMS is the integration of diamond films with other materials. Conventional CVD thin film deposition methods produce diamond films with large grains, high internal stress, poor intergranular adhesion and very rough surfaces, and are consequently ill-suited for MEMS applications. Diamond-like films offer an alternative, but are deposited using physical vapour deposition methods unsuitable for conformal deposition on high aspect ratio features, and generally they do not exhibit the outstanding mechanical properties of diamond. We describe a new ultrananocrystalline diamond (UNCD) film technology based on a microwave plasma technique using argon plasma chemistries that produce UNCD films with morphological and mechanical properties that are ideally suited for producing reliable MEMS devices. We have developed lithographic techniques for the fabrication of UNCD MEMS components, including cantilevers and multilevel devices, acting as precursors to micro-bearings and gears, making UNCD a promising material for the development of high performance MEMS devices. We also review the mechanical, tribological, electronic transport, chemical and biocompatibility properties of UNCD, which make this an ideal material for reliable, long endurance MEMS device use.

Fabrication of Diamond Microstructures by Using Dry and Wet Etching Methods

Precise Patterning of Diamond Films for MEMS Application

Microcontact printing fabrication of diamond MEMS cantilevers on silicon substrate

Patterning of Diamond Microstructures on Si Substrate by Bulk and Surface Micromachining

Patterning of Diamond Films by Rie and Its Mems Applications

Fabrication of concave microlenses on a diamond by a spin coating process.

CVD Diamond Microhinge for MOEMS Applications

A versatile method for nano-fabrication on diamond film: flexible diamond metasurfaces as a demonstration

Microcontact Printing of Monodiamond Nanoparticles: an Effective Route to Patterned Diamond Structure Fabrication

High-precision and high-speed etching of diamond surfaces using Fe–Ni alloy catalyzed H–O plasma etching

Reactive Ion Etching of Cvd Diamond Films for Mems Applications

Fabrication of Precision 3D Microstructures by Use of a Combination of Ultraprecision Diamond Turning and Reactive Ion Etching Process

Research on Etching Technologies of Diamond

Diamond Micro-Lenses with Variable Height Using Self-Assembly Silica-Microsphere-monolayer As Etching Mask

Patterned Microstructure Array Fabrication By Using A Novel Standing Surface Acoustic Wave Device

Fabrication of Diamond Microlenses by Chemical Reflow Method.

Materials Science and Fabrication Processes for A New Mems Technoloey Based on Ultrananocrystalline Diamond Thin Films

Fabrication of Microchannels in Single Crystal Diamond for Microfluidic Systems

Batch production of single-crystal diamond bridges and cantilevers for microelectromechanical systems

Micromachining of CVD diamond by RIE for MEMS applications

Fabrication of Diamond Submicron Lenses and Cylinders by ICP Etching Technique with SiO2 Balls Mask