P‐15: the Use of Fluorination to Enhance the Performance and the Reliability of Elevated‐Metal Metal‐Oxide Thin‐Film Transistors

Zhihe Xia,Lei Lu,Jiapeng Li,Hoi-Sing Kwok,Man Wong
DOI: https://doi.org/10.1002/sdtp.12133
2018-01-01
Abstract:The effects of fluorination on elevated‐metal metal‐oxide (EMMO) thin‐film transistors (TFT) were investigated. Attributed to the effective passivation of defects in the metal oxide, both the scalability and the reliability were enhanced on fluorinated indium‐gallium‐zinc oxide (IGZO) and indium‐tin‐zinc oxide (ITZO) EMMO TFTs.
What problem does this paper attempt to address?