Abstract:The optical properties of metals are mainly determined by their plasmonic excitations, with various intriguing phenomena associated with systems in reduced dimensions. In this paper, we present a systematic study of the plasmonic excitations in ultrathin metal films on dielectric substrates using two different theoretical approaches, and with Mg thin films on Si as prototype systems. The bulk of the results are obtained using the first approach within first-principles time-dependent local density approximation. We show that the presence of the substrate substantially modifies the plasmon hybridization of the metal films; in turn, the plasmon excitation in the films strongly enhances the absorption of the substrate. The detailed absorption spectra contain several intriguing features. Above the Mg surface plasmon mode, we observe a broad resonance due to the hybridization between the antisymmetric surface plasmon and multipole surface plasmon. Furthermore, below the Mg surface plasmon mode, there also exists a broad absorption feature, caused by individual electron-hole pair excitations. In the second approach, we use a semi-classical local optics model to reveal an intrinsic connection between the broad absorption feature and the multipole surface plasmon modes, which result from the single-particle and collective excitations of the same surface electrons, respectively. Our theoretical predictions on the plasmon dispersions and absorption spectra are also shown to be qualitatively consistent with the latest experimental observations using electron energy loss spectroscopy for Mg thin films grown on Si substrates.

Interaction of Surface and Interface Plasmons in Extremely Thin Al Films on Si(111)

Thickness Dependence of the Surface Plasmon Dispersion in Ultrathin Aluminum Films on Silicon

Symmetry-dependent Screening of Surface Plasmons in Ultrathin Supported Films: the Case of Al/Si(111)

Growing Extremely Thin Bulklike Metal Film on a Semiconductor Surface: Monolayer Al(111) on Si(111)

Study Of The Na-Si(111) 3x1 Interface Using Core-Level Photoemission Spectroscopy

Thickness Dependence of Surface Plasmon Damping and Dispersion in Ultrathin Ag Films

Shrunk Lattice Structure and Interdiffusion Characteristics of 5 Nm Thick Al(2)O(3) Ultrathin Films Sputtered on Silicon.

Interfacial protection of topological surface states in ultrathin Sb films.

Topological Limit of Ultrathin Quasi-Free-Standing Bi2te3 Films Grown on Si(111)

Surface Atomic Arrangement of Aluminum Ultra-Thin Layers Grown on Si(111)

Collective Excitations and Quantum Size Effects on the Surfaces of Pb(111) Films: an Experimental Study*

Two-Dimensional Growth Of Al Films On Si(111)-7 X 7 At Low-Temperature

Room-Temperature Growth Of Al Films On Si(111)-7x7 Surface

Surface structure of the 3x3-Si phase on Al(111), studied by the multiple usages of positron diffraction and core-level photoemission spectroscopy

Room-Temperature Growth of Al Films on Si(111)-7 7 Surface

X-ray Diffraction Studies of Trilayer Oscillations in the Preferred Thickness of in Films on Si(111)

Resonant Coupling of Surface and Bulk Plasmon Polaritons in Metallic Nanostructures

Surface Josephson plasma waves in a high-temperature superconductor

Surface Morphologies of Pb Thin Films on Si(111)

Surface And Interface Study Of U/Si (111)

Plasmonic Excitations in Ultrathin Metal Films on Dielectric Substrates