Topological Limit of Ultrathin Quasi-Free-standing Bi2Te3films Grown on Si(111)

Guang Bian
DOI: https://doi.org/10.1103/physrevb.85.195442
2012-01-01
Abstract:A fundamental issue for ultrathin topological films is the thickness limit below which the topological surface states become impacted by interfacial interaction. We show that for Bi 2 Te 3 grown on Si(111) this limit is 4 quintuple layers based on angle-resolved photoemission measurements, using optimized photon energies and polarizations, of the Dirac cone warping and interaction-induced gap as a function of film thickness. The results are close to theoretical predictions for freestanding films. Evidence is presented to show why the substrate-film interaction is actually weak.
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