Stable nontrivial Z2 topology in ultrathin Bi (111) films: a first-principles study

Zheng Liu,Chao-Xing Liu,Yong-Shi Wu,Wen-Hui Duan,Feng Liu,Jian Wu
DOI: https://doi.org/10.48550/arXiv.1104.0978
2011-04-06
Materials Science
Abstract:Recently, there have been intense efforts in searching for new topological insulator (TI) materials. Based on first-principles calculations, we find that all the ultrathin Bi (111) films are characterized by a nontrivial Z2 number independent of the film thickness, without the odd-even oscillation of topological triviality as commonly perceived. The stable nontrivial Z2 topology is retained by the concurrent band gap inversions at multiple time-reversal-invariant k-points and associated with the intermediate inter-bilayer coupling of the multi-bilayer Bi film. Our calculations further indicate that the presence of metallic surface states in thick Bi(111) films can be effectively removed by surface adsorption.
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