Interfacial Bonding and Structure of Bi2te3 Topological Insulator Films on Si(111) Determined by Surface X-Ray Scattering

Y. Liu,H. -H. Wang,G. Bian,Z. Zhang,S. S. Lee,P. A. Fenter,J. Z. Tischler,H. Hong,T. -C. Chiang
DOI: https://doi.org/10.1103/physrevlett.110.226103
IF: 8.6
2013-01-01
Physical Review Letters
Abstract:Interfacial topological states are a key element of interest for topological insulator thin films, and their properties can depend sensitively on the atomic bonding configuration. We employ in situ nonresonant and resonant surface x-ray scattering to study the interfacial and internal structure of a prototypical topological film system: Bi2Te3 grown on Si(111). The results reveal a Te-dominated buffer layer, a large interfacial spacing, and a slightly relaxed and partially strained bottom quintuple layer of an otherwise properly stacked bulklike Bi2Te3 film. The presence of the buffer layer indicates a nontrivial process of interface formation and a mechanism for electronic decoupling between the topological film and the Si(111) substrate.
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